D2, Deuterium, CAS# 7782-39-0
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy|
|2||Fundamental beam studies of radical enhanced atomic layer deposition of TiN|