TiCl₄, Titanium Tetrachloride, CAS# 7550-45-0

Informational Websites

Number	Website
1	http://webbook.nist.gov/cgi/cbook.cgi?ID=7550-45-0
2	https://en.wikipedia.org/wiki/Titanium_tetrachloride

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Titanium(IV) chloride, 99%
2	Gelest	Titanium Tetrachloride, 99%
3	Strem Chemicals, Inc.	Titanium(IV) chloride, (99.99+%-Ti) PURATREM
4	Strem Chemicals, Inc.	Titanium(IV) chloride, 99%, contained in 50 ml cylinder for CVD/ALD

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 69 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
2	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
3	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
4	Tribological properties of thin films made by atomic layer deposition sliding against silicon
5	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
7	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
8	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
9	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
10	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
11	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
12	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
13	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
14	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
15	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
16	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
17	Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
18	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
19	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
20	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
21	Film Uniformity in Atomic Layer Deposition
22	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
23	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
24	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
25	In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
26	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
27	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
28	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
29	Microwave properties of superconducting atomic-layer deposited TiN films
30	New materials for memristive switching
31	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
32	Nitride memristors
33	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
34	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
35	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
36	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
37	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
38	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
39	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
40	Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
41	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
42	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
43	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
44	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
45	Silicon nanowire networks for multi-stage thermoelectric modules
46	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
47	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
48	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
49	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
50	Tribological properties of thin films made by atomic layer deposition sliding against silicon
51	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
52	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
53	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
54	Breakdown and Protection of ALD Moisture Barrier Thin Films
55	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
56	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
57	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
58	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
59	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
60	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
61	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
62	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
63	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
64	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
65	The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
66	Tribological properties of thin films made by atomic layer deposition sliding against silicon
67	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
68	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
69	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma

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