TiCl4, Titanium Tetrachloride, CAS# 7550-45-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7550-45-0
2https://en.wikipedia.org/wiki/Titanium_tetrachloride

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) chloride, 99%, contained in 50 ml cylinder for CVD/ALD
2EpiValenceπŸ‡¬πŸ‡§Titanium chloride
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) chloride, 99%
4Sigma-Aldrich, Co. LLCπŸ‡ΊπŸ‡ΈTitanium(IV) chloride
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) chloride, (99.99+%-Ti) PURATREM
6DOCK/CHEMICALSπŸ‡©πŸ‡ͺTitaniumtetrachloride
7Pegasus ChemicalsπŸ‡¬πŸ‡§Titanium(IV)chloride
8Alfa AesarπŸ‡ΊπŸ‡ΈTitanium(IV) chloride, 99.99% (metals basis)
9GelestπŸ‡ΊπŸ‡ΈTitanium Tetrachloride, 99%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 79 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
2Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
3Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
4Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
5Tribological properties of thin films made by atomic layer deposition sliding against silicon
6Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
7Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
8Breakdown and Protection of ALD Moisture Barrier Thin Films
9Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
10Silicon nanowire networks for multi-stage thermoelectric modules
11Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
12TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
13Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
14Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
15Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
16Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
17Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
18Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
19Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
20Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
21TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
22Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
23Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
24Tribological properties of thin films made by atomic layer deposition sliding against silicon
25The Ξ± and Ξ³ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
26Nitride memristors
27Tribological properties of thin films made by atomic layer deposition sliding against silicon
28Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
29Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
30High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
31In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
32Protective capping and surface passivation of III-V nanowires by atomic layer deposition
33Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
34Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
35Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
36Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
37Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
38Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
39Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
40Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
41Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
42Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
43Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
44Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
45Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
46Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
47Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
48Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
49Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
50Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
51Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
52In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
53New materials for memristive switching
54Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
55Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
56Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
57Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
58Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
59Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
60Fundamental beam studies of radical enhanced atomic layer deposition of TiN
61NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
62Microwave properties of superconducting atomic-layer deposited TiN films
63Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
64Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
65Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
66Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
67Radical Enhanced Atomic Layer Deposition of Metals and Oxides
68Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
69Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
70Fabrication and deformation of three-dimensional hollow ceramic nanostructures
71Film Uniformity in Atomic Layer Deposition
72Protective capping and surface passivation of III-V nanowires by atomic layer deposition
73Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
74Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
75Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
76Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
77Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
78Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
79Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor