TiCl4, Titanium Tetrachloride, CAS# 7550-45-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7550-45-0
2https://en.wikipedia.org/wiki/Titanium_tetrachloride

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Titanium(IV) chloride, (99.99+%-Ti) PURATREM
2Pegasus Chemicals🇬🇧Titanium(IV)chloride
3Strem Chemicals, Inc.🇺🇸Titanium(IV) chloride, 99%
4Sigma-Aldrich, Co. LLC🇺🇸Titanium(IV) chloride
5Alfa Aesar🇺🇸Titanium(IV) chloride, 99.99% (metals basis)
6Gelest🇺🇸Titanium Tetrachloride, 99%
7Strem Chemicals, Inc.🇺🇸Titanium(IV) chloride, 99%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 79 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
2Nitride memristors
3Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
4Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
5In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
6Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
7Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
8Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
9TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
10Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
11Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
12Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
13Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
14New materials for memristive switching
15Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
16Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
17Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
18Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
19Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
20High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
21Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
22Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
23Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
24Film Uniformity in Atomic Layer Deposition
25Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
26Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
27Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
28Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
29Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
30Microwave properties of superconducting atomic-layer deposited TiN films
31Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
32Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
33Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
34Breakdown and Protection of ALD Moisture Barrier Thin Films
35Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
36Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
37Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
38Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
39Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
40Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
41Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
42In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
43Tribological properties of thin films made by atomic layer deposition sliding against silicon
44Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
45Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
46Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
47Tribological properties of thin films made by atomic layer deposition sliding against silicon
48Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
49Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
50Silicon nanowire networks for multi-stage thermoelectric modules
51Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
52Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
53Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
54Fundamental beam studies of radical enhanced atomic layer deposition of TiN
55Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
56NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
57Protective capping and surface passivation of III-V nanowires by atomic layer deposition
58Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
59Fabrication and deformation of three-dimensional hollow ceramic nanostructures
60Radical Enhanced Atomic Layer Deposition of Metals and Oxides
61Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
62Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
63Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
64Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
65Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
66Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
67Tribological properties of thin films made by atomic layer deposition sliding against silicon
68The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
69Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
70Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
71Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
72Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
73TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
74Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
75Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
76Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
77Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
78Protective capping and surface passivation of III-V nanowires by atomic layer deposition
79Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films