TiCl4, Titanium Tetrachloride, CAS# 7550-45-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7550-45-0
2https://en.wikipedia.org/wiki/Titanium_tetrachloride

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Titanium(IV) chloride, 99%, contained in 50 ml cylinder for CVD/ALD
2Strem Chemicals, Inc.Titanium(IV) chloride, (99.99+%-Ti) PURATREM
3Strem Chemicals, Inc.Titanium(IV) chloride, 99%
4Sigma-Aldrich, Co. LLCTitanium(IV) chloride
5GelestTitanium Tetrachloride, 99%

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 70 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
2Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
3Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
4Tribological properties of thin films made by atomic layer deposition sliding against silicon
5Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
7Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
8Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
9Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
10Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
11Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
12Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
13Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
14Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
15Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
16Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
17Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
18Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
19Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
20Fabrication and deformation of three-dimensional hollow ceramic nanostructures
21Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
22Film Uniformity in Atomic Layer Deposition
23Fundamental beam studies of radical enhanced atomic layer deposition of TiN
24Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
25Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
26In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
27In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
28Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
29Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
30Microwave properties of superconducting atomic-layer deposited TiN films
31New materials for memristive switching
32NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
33Nitride memristors
34Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
35Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
36Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
37Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
38Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
39Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
40Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
41Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
42Protective capping and surface passivation of III-V nanowires by atomic layer deposition
43Radical Enhanced Atomic Layer Deposition of Metals and Oxides
44Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
45Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
46Silicon nanowire networks for multi-stage thermoelectric modules
47Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
48Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
49TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
50TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
51Tribological properties of thin films made by atomic layer deposition sliding against silicon
52Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
53Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
54Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
55Breakdown and Protection of ALD Moisture Barrier Thin Films
56Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
57Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
58Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
59High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
60Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
61Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
62Protective capping and surface passivation of III-V nanowires by atomic layer deposition
63Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
64Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
65Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
66The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
67Tribological properties of thin films made by atomic layer deposition sliding against silicon
68Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
69Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
70Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma