Titanium Tetrachloride, TiCl4, CAS# 7550-45-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7550-45-0
2https://en.wikipedia.org/wiki/Titanium_tetrachloride

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 55 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
2Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
3Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
4Tribological properties of thin films made by atomic layer deposition sliding against silicon
5Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
7Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
8Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
9Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
10Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
11Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
12Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
13Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
14Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
15Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
16Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
17Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
18Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
19Fabrication and deformation of three-dimensional hollow ceramic nanostructures
20Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
21Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
22Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
23Microwave properties of superconducting atomic-layer deposited TiN films
24New materials for memristive switching
25NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
26Nitride memristors
27Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
28Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
29Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
30Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
31Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
32Radical Enhanced Atomic Layer Deposition of Metals and Oxides
33Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
34Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
35Silicon nanowire networks for multi-stage thermoelectric modules
36Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
37Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
38TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
39TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
40Tribological properties of thin films made by atomic layer deposition sliding against silicon
41Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
42Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
43Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
44Breakdown and Protection of ALD Moisture Barrier Thin Films
45Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
46Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
47High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
48Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
49Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
50Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
51Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
52Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
53Tribological properties of thin films made by atomic layer deposition sliding against silicon
54Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
55Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma


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