TiCl₄, Titanium Tetrachloride, CAS# 7550-45-0

Informational Websites

Number	Website
1	http://webbook.nist.gov/cgi/cbook.cgi?ID=7550-45-0
2	https://en.wikipedia.org/wiki/Titanium_tetrachloride

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Titanium(IV) chloride, 99%
2	Strem Chemicals, Inc.	Titanium(IV) chloride, 99%, contained in 50 ml cylinder for CVD/ALD
3	Strem Chemicals, Inc.	Titanium(IV) chloride, (99.99+%-Ti) PURATREM

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 56 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
2	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
3	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
4	Tribological properties of thin films made by atomic layer deposition sliding against silicon
5	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
7	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
8	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
9	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
10	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
11	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
12	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
13	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
14	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
15	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
16	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
17	Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
18	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
19	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
20	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
21	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
22	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
23	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
24	Microwave properties of superconducting atomic-layer deposited TiN films
25	New materials for memristive switching
26	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
27	Nitride memristors
28	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
29	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
30	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
31	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
32	Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
33	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
34	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
35	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
36	Silicon nanowire networks for multi-stage thermoelectric modules
37	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
38	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
39	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
40	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
41	Tribological properties of thin films made by atomic layer deposition sliding against silicon
42	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
43	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
44	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
45	Breakdown and Protection of ALD Moisture Barrier Thin Films
46	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
47	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
48	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
49	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
50	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
51	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
52	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
53	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
54	Tribological properties of thin films made by atomic layer deposition sliding against silicon
55	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
56	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma

Shortcuts

© 2014-2019 plasma-ald.com