TiCl4, Titanium Tetrachloride, CAS# 7550-45-0
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 66 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|
| 1 | Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal |
| 2 | Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition |
| 3 | Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers |
| 4 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 5 | Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition |
| 6 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
| 7 | Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition |
| 8 | Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition |
| 9 | Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors |
| 10 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
| 11 | Atomic layer deposition of TiN for the fabrication of nanomechanical resonators |
| 12 | Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition |
| 13 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
| 14 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
| 15 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
| 16 | Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films |
| 17 | Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si |
| 18 | Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications |
| 19 | Fabrication and deformation of three-dimensional hollow ceramic nanostructures |
| 20 | Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks |
| 21 | Film Uniformity in Atomic Layer Deposition |
| 22 | Fundamental beam studies of radical enhanced atomic layer deposition of TiN |
| 23 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
| 24 | Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System |
| 25 | In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential |
| 26 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition |
| 27 | Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals |
| 28 | Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition |
| 29 | Microwave properties of superconducting atomic-layer deposited TiN films |
| 30 | New materials for memristive switching |
| 31 | NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors |
| 32 | Nitride memristors |
| 33 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
| 34 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
| 35 | Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN |
| 36 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
| 37 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
| 38 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
| 39 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
| 40 | Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films |
| 41 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 42 | Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration |
| 43 | Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance |
| 44 | Silicon nanowire networks for multi-stage thermoelectric modules |
| 45 | Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics |
| 46 | Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System |
| 47 | TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD |
| 48 | TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition |
| 49 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 50 | Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization |
| 51 | Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy |
| 52 | Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition |
| 53 | Breakdown and Protection of ALD Moisture Barrier Thin Films |
| 54 | Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition |
| 55 | Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support |
| 56 | Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification |
| 57 | High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films |
| 58 | Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition |
| 59 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
| 60 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
| 61 | Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition |
| 62 | Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films |
| 63 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 64 | Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy |
| 65 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
| 66 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
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