2021 Year in Review

The publication database currently has 1628 entries.

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203 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

251 Film and Plasma Characteristics

90 Theses

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Effect of atomic layer plasma treatment on TALD-ZrO₂ film to improve the corrosion protection of Mg-Ca alloy Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation

Search 1628 plasma ALD publications by:

203 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

251 Film and Plasma Characteristics

TiCl₄, Titanium Tetrachloride, CAS# 7550-45-0

Informational Websites

Number	Website
1	http://webbook.nist.gov/cgi/cbook.cgi?ID=7550-45-0
2	https://en.wikipedia.org/wiki/Titanium_tetrachloride

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Titanium(IV) chloride, (99.99+%-Ti) PURATREM
2	Alfa Aesar	Titanium(IV) chloride, 99.99% (metals basis)
3	Strem Chemicals, Inc.	Titanium(IV) chloride, 99%, contained in 50 ml cylinder for CVD/ALD
4	Strem Chemicals, Inc.	Titanium(IV) chloride, 99%
5	Sigma-Aldrich, Co. LLC	Titanium(IV) chloride
6	EpiValence	Titanium chloride
7	Gelest	Titanium Tetrachloride, 99%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 77 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
2	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
3	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
4	Tribological properties of thin films made by atomic layer deposition sliding against silicon
5	Antioxidation properties of Ti_0.83Al_0.17N prepared using plasma-enhanced atomic layer deposition
6	Controlling the composition of Ti_1-xAl_xN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
7	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
8	Antioxidation properties of Ti_0.83Al_0.17N prepared using plasma-enhanced atomic layer deposition
9	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
10	Atomic layer deposition of Ru from CpRu(CO)₂Et using O₂ gas and O₂ plasma
11	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
12	Bipolar Resistive Switching Characteristics of HfO₂/TiO₂/HfO₂ Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
13	Conformal Formation of (GeTe₂)_(1-x)(Sb₂Te₃)_x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
14	Controlling the composition of Ti_1-xAl_xN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
15	Deposition of TiN and HfO₂ in a commercial 200 mm remote plasma atomic layer deposition reactor
16	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
17	Electron Transport Across Ultrathin Ferroelectric Hf_0.5Zr_0.5O₂ Films on Si
18	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
19	Excellent resistive switching properties of atomic layer-deposited Al₂O₃/HfO₂/Al₂O₃ trilayer structures for non-volatile memory applications
20	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
21	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO₂/TiN stacks
22	Film Uniformity in Atomic Layer Deposition
23	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
24	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
25	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl₄/NH₃ System
26	In situ dry cleaning of Si wafer using OF₂/NH₃ remote plasma with low global warming potential
27	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
28	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl₄ and N₂/H₂/Ar radicals
29	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
30	Microwave properties of superconducting atomic-layer deposited TiN films
31	New materials for memristive switching
32	NiCO₂O₄@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
33	Nitride memristors
34	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
35	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
36	Plasma Enhanced Atomic Layer Deposition of Al₂O₃ and TiN
37	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
38	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
39	Plasma-assisted atomic layer deposition of TiN/Al₂O₃ stacks for metal-oxide-semiconductor capacitor applications
40	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl₄ , SiH₄, and N₂/H₂/Ar Plasma
41	Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
42	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
43	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
44	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
45	Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
46	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
47	Silicon nanowire networks for multi-stage thermoelectric modules
48	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
49	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
50	Tailoring angular selectivity in SiO₂ slanted columnar thin films using atomic layer deposition of titanium nitride
51	TiCl₄ as a Precursor in the TiN Deposition by ALD and PEALD
52	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
53	Tribological properties of thin films made by atomic layer deposition sliding against silicon
54	Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
55	Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
56	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
57	Band alignment of atomic layer deposited TiO₂/multilayer MoS₂ interface determined by x-ray photoelectron spectroscopy
58	Bipolar Resistive Switching Characteristics of HfO₂/TiO₂/HfO₂ Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
59	Breakdown and Protection of ALD Moisture Barrier Thin Films
60	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
61	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
62	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
63	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
64	Investigation of residual chlorine in TiO₂ films grown by Atomic Layer Deposition
65	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO₂ Using TiCl₄
66	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
67	Relationships among growth mechanism, structure and morphology of PEALD TiO₂ films: the influence of O₂ plasma power, precursor chemistry and plasma exposure mode
68	Residual chlorine in TiO₂ films grown at low temperatures by plasma enhanced atomic layer deposition
69	Room temperature plasma enhanced atomic layer deposition for TiO₂ and WO₃ films
70	The α and γ plasma modes in plasma-enhanced atomic layer deposition with O₂-N₂ capacitive discharges
71	Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
72	Tribological properties of thin films made by atomic layer deposition sliding against silicon
73	Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
74	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
75	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
76	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl₄ , SiH₄, and N₂/H₂/Ar Plasma
77	Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition