Publication Information

Title: Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 021515 (2018)

Date: 2018-01-09

DOI: http://dx.doi.org/10.1116/1.5001552

Author Information

Name

Institution

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

University of Tsukuba

Films

Deposition Temperature Range = 25-100C

7550-45-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Porosity

PAS, Positron Annihilation Spectroscopy

Unknown

Porosity

Ellipsometric Porosimetry (EP)

Unknown

Wet Etch Resistance

Unknown

Unknown

Ion Energy

Ion Energy Analyzer

Custom

Electron Density, ne

Plasma Absorption Probe

Custom

Substrates

Si(100)

Keywords

Notes

1271



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