Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 021515 (2018)
Date:
2018-01-09

Author Information

Name Institution
Shinya IwashitaTokyo Electron Technology Solutions, Ltd.
Tsuyoshi MoriyaTokyo Electron Technology Solutions, Ltd.
Takamichi KikuchiTokyo Electron Technology Solutions, Ltd.
Munehito KagayaTokyo Electron Technology Solutions, Ltd.
Naotaka NoroTokyo Electron Technology Solutions, Ltd.
Toshio HasegawaTokyo Electron Technology Solutions, Ltd.
Akira UedonoUniversity of Tsukuba

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Porosity
Analysis: PAS, Positron Annihilation Spectroscopy

Characteristic: Porosity
Analysis: Ellipsometric Porosimetry (EP)

Characteristic: Wet Etch Resistance
Analysis: -

Characteristic: Ion Energy
Analysis: Ion Energy Analyzer

Characteristic: Electron Density, ne
Analysis: Plasma Absorption Probe

Substrates

Si(100)

Keywords

Notes

1271