Publication Information

Title: Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 021515 (2018)

Date: 2018-01-09

DOI: http://dx.doi.org/10.1116/1.5001552

Author Information

Name

Institution

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

Tokyo Electron Technology Solutions, Ltd.

University of Tsukuba

Films

Deposition Temperature Range = 25-100C

7550-45-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Refractive Index

Ellipsometry

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Density

RBS, Rutherford Backscattering Spectrometry

-

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

-

Porosity

PAS, Positron Annihilation Spectroscopy

-

Porosity

Ellipsometric Porosimetry (EP)

-

Wet Etch Resistance

Unknown

-

Ion Energy

Ion Energy Analyzer

Custom

Electron Density, ne

Plasma Absorption Probe

Custom

Substrates

Si(100)

Keywords

Notes

1271



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