Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Takamichi Kikuchi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Takamichi Kikuchi returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
2Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition