Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films

Type:
Journal
Info:
Thin Solid Films 660 (2018) 865-870
Date:
2018-03-01

Author Information

Name Institution
Shinya IwashitaTokyo Electron Technology Solutions, Ltd.
Kazuki DenpohTokyo Electron Technology Solutions, Ltd.
Munehito KagayaTokyo Electron Technology Solutions, Ltd.
Takamichi KikuchiTokyo Electron Technology Solutions, Ltd.
Naotaka NoroTokyo Electron Technology Solutions, Ltd.
Toshio HasegawaTokyo Electron Technology Solutions, Ltd.
Tsuyoshi MoriyaTokyo Electron Technology Solutions, Ltd.
Akira UedonoUniversity of Tsukuba

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Wet Etch Resistance
Analysis: Wet Etch

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Ion Energy
Analysis: Ion Energy Analyzer

Substrates

Si(100)
Amorphous C

Keywords

Substrate Biasing

Notes

1639