Publication Information

Title:
TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Materials Science Forum, Vol. 817, pp. 466-471, 2015
Date:
2015-04-10

Author Information

Name Institution
Yi JiaZhejiang University
Rou Gang TangJiaxing Microelectronic Equipment
Wei Er LuInstitute of Microelectronics of Chinese Academy of Sciences
You Tong FangZhejiang University
Yang XiaJiaxing Microelectronic Equipment

Films

Plasma TiN


Plasma AlN


Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Hardness
Analysis: Nanoindentation

Substrates

Si(001)

Keywords

Notes

548