Publication Information

Title: TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition

Type: Journal

Info: Materials Science Forum, Vol. 817, pp. 466-471, 2015

Date: 2015-04-10

DOI: http://dx.doi.org/10.4028/www.scientific.net/MSF.817.466

Author Information

Name

Institution

Zhejiang University

Jiaxing Microelectronic Equipment

Institute of Microelectronics of Chinese Academy of Sciences

Zhejiang University

Jiaxing Microelectronic Equipment

Films

Deposition Temperature Range N/A

7550-45-0

7664-41-7

Deposition Temperature Range N/A

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Hardness

Nanoindentation

Unknown

Substrates

Si(001)

Keywords

Notes

548



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