Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


PEALD-200A, Jiaxing Kemicro Microelectronic Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using PEALD-200A, Jiaxing Kemicro Microelectronic hardware returned 4 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
4Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions