Publication Information

Title: Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition

Type: Journal

Info: Mater. Express, Vol. 8, No. 5, 2018

Date: 2018-08-14

DOI: http://dx.doi.org/doi:10.1166/mex.2018.1456

Author Information

Name

Institution

Nanchang University

Nanchang University

Nanchang University

Nanchang University

Nanchang University

Nanchang University

Nanchang University

Nanchang University

Nanchang University

Films

Deposition Temperature = 50C

75-24-1

7782-44-7

Deposition Temperature = 50C

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Unknown

Interfacial Layer

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Silicon

CsPbBr3

Keywords

Plasma vs Thermal Comparison

Encapsulation

Diffusion Barrier

Notes

1282



Shortcuts



© 2014-2019 plasma-ald.com