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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support

Type:
Journal
Info:
Chem. Eur. J. 10.1002/chem.201703391
Date:
2017-09-13
DOI:
http://dx.doi.org/10.1002/chem.201703391

Author Information

Name Institution
Ville RontuAalto University
Anne SelentUniversity of Oulu
Vladimir V. ZhivonitkoUniversity of Oulu
Gianmario ScottiAalto University
Igor V. KoptyugInternational Tomography Center SB RAS
Ville-Veikko TelkkiUniversity of Oulu
Sami FranssilaAalto University

Films

Plasma Pt

Hardware used: Picosun R200
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Thermal TiO2

Hardware used: Picosun R200
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Nucleation
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Technai F20

Characteristic: Catalysis
Analysis: NMR, Nuclear Magnetic Resonance
Diagnostic: Bruker DSX 300

Substrates

Silicon
Si3N4
TiO2

Notes

1078