Publication Information

Title:
Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
Type:
Journal
Info:
Microelectronic Engineering Volume 178, 25 June 2017, Pages 250-253
Date:
2017-06-25

Author Information

Name Institution
A. ChouprikMoscow Institute of Physics and Technology
A. G. ChernikovaMoscow Institute of Physics and Technology
Andrey M. MarkeevMoscow Institute of Physics and Technology
V. MikheevMoscow Institute of Physics and Technology
D. V. NegrovMoscow Institute of Physics and Technology
M. SpiridonovMoscow Institute of Physics and Technology
Sergey S. ZarubinMoscow Institute of Physics and Technology
A. ZenkevichMoscow Institute of Physics and Technology

Films

Plasma TiN


Film/Plasma Properties

Substrates

HfZrO2

Keywords

Notes

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