Publication Information

Title:
Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
Type:
Journal
Info:
J. Phys. Chem. C, 2009, 113 (37), pp 16307-16310
Date:
2009-08-12

Author Information

Name Institution
Nicholas G. KubalaColorado School of Mines
Pieter RowletteColorado School of Mines
Colin A. WoldenColorado School of Mines

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Surface Reactions
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Silicon

Keywords

Notes

752