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Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films

Type:
Journal
Info:
Phys. Rev. B 88, 180505, 2013
Date:
2013-10-10
DOI:
http://dx.doi.org/10.1103/PhysRevB.88.180505

Author Information

Name Institution
P. C. J. J. CoumouDelft University of Technology
E. F. C. DriessenCEA - INAC
J. BuenoSRON National Institute for Space Research
C. ChapelierCEA - INAC
T. M. KlapwijkDelft University of Technology

Films

Plasma TiN

Hardware used: Unknown
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Bar Structures
Diagnostic: -

Characteristic: Superconductivity
Analysis: -
Diagnostic: -

Substrates

Si(100)

Notes

Paper available as chapter 6 in on-line thesis.
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