Publication Information

Title:
Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
Type:
Journal
Info:
Annalen der Physik, Volume 529, Issue 11, 2017, Pages 1600410
Date:
2017-07-05

Author Information

Name Institution
Mehrdad ShayganApplied Micro and Optoelectronic (AMO) GmbH
Martin OttoApplied Micro and Optoelectronic (AMO) GmbH
Abhay A. SagadeApplied Micro and Optoelectronic (AMO) GmbH
Carlos A. ChavarinUniversity Duisburg-Essen
Gerd BacherUniversity Duisburg-Essen
Wolfgang MertinUniversity Duisburg-Essen
Daniel NeumaierApplied Micro and Optoelectronic (AMO) GmbH

Films

Plasma AlTixOy


Film/Plasma Properties

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Transistor Characteristics
Analysis: Transistor Characterization

Substrates

Silicon

Keywords

Notes

1094