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Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 06A104 (2018)
Date:
2018-09-07
Author Information
| Name | Institution |
|---|---|
| Shinya Iwashita | Tokyo Electron Technology Solutions, Ltd. |
| Tsuyoshi Moriya | Tokyo Electron Technology Solutions, Ltd. |
| Akira Uedono | University of Tsukuba |
Films
Plasma TiSiO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Microstructure
Analysis: PAS, Positron Annihilation Spectroscopy
Characteristic: Wet Etch Resistance
Analysis: Custom
Substrates
| Si(100) |
Notes
| 1543 |