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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Fabrication and deformation of three-dimensional hollow ceramic nanostructures
Type:
Journal
Info:
Nature Materials vol. 12, no. 10, pp. 893 - 898, 2013.
Date:
2013-07-17
Author Information
| Name | Institution |
|---|---|
| Dongchan Jang | California Institute of Technology |
| Lucas R. Meza | California Institute of Technology |
| Frank Greer | Jet Propulsion Laboratory |
| Julia R. Greer | California Institute of Technology |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Mechanical Properties
Analysis: Compression Testing
Substrates
| Photoresist |
Notes
| 596 |