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Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Texture of atomic layer deposited ruthenium
Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
Fabrication and deformation of three-dimensional hollow ceramic nanostructures
Type:
Journal
Info:
Nature Materials vol. 12, no. 10, pp. 893 - 898, 2013.
Date:
2013-07-17
Author Information
| Name | Institution |
|---|---|
| Dongchan Jang | California Institute of Technology |
| Lucas R. Meza | California Institute of Technology |
| Frank Greer | Jet Propulsion Laboratory |
| Julia R. Greer | California Institute of Technology |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Mechanical Properties
Analysis: Compression Testing
Substrates
| Photoresist |
Keywords
| Hollow Nanofibers |
Notes
| 596 |