Publication Information

Title:
Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 698, 2017, Pages 141 - 146
Date:
2016-12-18

Author Information

Name Institution
Xinke LiuShenzhen University
Le ChenShenzhen University
Qiang LiuShanghai Institute of Microsystem and Information Technology
Jiazhu HeShenzhen University
Kuilong LiShenzhen University
Wenjie YuShanghai Institute of Microsystem and Information Technology
Jin-Ping AoShenzhen University
Kah-Wee AngNational University Singapore

Films

Plasma TiO2


Film/Plasma Properties

Substrates

Silicon

Keywords

Notes

920