The publication database currently has 1573 entries.
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196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
242 Film and Plasma Characteristics
84 Theses
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
Search 1573 plasma ALD publications by:
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Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
Type:
Conference Proceedings
Info:
2010 IEEE International 3D Systems Integration Conference (3DIC)
Date:
2010-11-16
Author Information
| Name | Institution |
|---|---|
| J. D. Reed | RTI International |
| S. Goodwin | RTI International |
| C. Gregory | RTI International |
| D. Temple | RTI International |
Films
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: -
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| SiO2 |
Keywords
| Plasma vs Thermal Comparison |
Notes
| 731 |