Publication Information

Title: Microwave properties of superconducting atomic-layer deposited TiN films

Type: Journal

Info: IEEE Transactions on Applied Superconductivity, (Volume:23, Issue:3)

Date: 2012-12-27

DOI: http://dx.doi.org/10.1109/TASC.2012.2236603

Author Information

Name

Institution

Delft University of Technology

Delft University of Technology

Delft University of Technology

Delft University of Technology

SRON National Institute for Space Research

Delft University of Technology

Films

Deposition Temperature = 400C

7550-45-0

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Profilometry

-

Critical Temperature

Hall Bar Structures

-

Resistivity, Sheet Resistance

Hall Bar Structures

-

Hall Voltage

Hall Bar Structures

-

Carrier Concentration

Hall Bar Structures

-

Microwave Properties

Quarter Wave Resonators

-

Substrates

Si with native oxide

Keywords

Superconductor

Notes

Available with additional TEM analysis in Coumou Thesis.

146



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