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Microwave properties of superconducting atomic-layer deposited TiN films
Type:
Journal
Info:
IEEE Transactions on Applied Superconductivity, (Volume:23, Issue:3)
Date:
2012-12-27
Author Information
| Name | Institution |
|---|---|
| P. C. J. J. Coumou | Delft University of Technology |
| M. R. Zuiddam | Delft University of Technology |
| E. F. C. Driessen | Delft University of Technology |
| P. J. de Visser | Delft University of Technology |
| J. J. A. Baselmans | SRON National Institute for Space Research |
| T. M. Klapwijk | Delft University of Technology |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Critical Temperature
Analysis: Hall Bar Structures
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Bar Structures
Characteristic: Hall Voltage
Analysis: Hall Bar Structures
Characteristic: Carrier Concentration
Analysis: Hall Bar Structures
Characteristic: Microwave Properties
Analysis: Quarter Wave Resonators
Substrates
| Si with native oxide |
Notes
| Available with additional TEM analysis in Coumou Thesis. |
| 146 |