The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Scientific Reports 9, Article number: 10438 (2019)
Date:
2019-07-18
Author Information
| Name | Institution |
|---|---|
| Min Li | Nanjing University |
| Zhi-Xian Jin | Nanjing University |
| Wei Zhang | Nanjing University |
| Yu-Hang Bai | Nanjing University |
| Yanqiang Cao | Nanjing University |
| Wei-Ming Li | Nanjing University |
| Di Wu | Nanjing University |
| Aidong Li | Nanjing University |
Films
Thermal TiO2
Plasma TiO2
Thermal ZrO2
Plasma ZrO2
Thermal HfO2
Plasma HfO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy
Characteristic: Electrochemical Performance
Analysis: Linear Sweep Voltammetry
Substrates
| Si(100) |
Notes
| 1660 |