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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Type:
Journal
Info:
Optical Materials Express, v. 9, n. 12, p. 4556--4563 (2019)
Date:
2019-09-12
Author Information
| Name | Institution |
|---|---|
| Sasha Woodward-Gagné | Polytechnique Montréal |
| Nicolas Desjardins-Lecavalier | Polytechnique Montréal |
| Bill Baloukas | Polytechnique Montréal |
| Oleg Zabeida | Polytechnique Montréal |
| Ludvik Martinu | Polytechnique Montréal |
Films
Thermal TiN
Film/Plasma Properties
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Transmittance
Analysis: Optical Transmission
Substrates
| SiO2 |
Notes
| 1616 |