Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Kurt J Lesker ALD-150LX Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Kurt J Lesker ALD-150LX hardware returned 22 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
2Atomic Layer Deposition of Nanolayered Carbon Films
3Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
4Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
5Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
6Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
7AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
8Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
9Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
10A route to low temperature growth of single crystal GaN on sapphire
11Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
12Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
13Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
14Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
15Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
16Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
17High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
18Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
19Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
20Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
21Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
22Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices