Kurt J Lesker ALD-150LX Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Kurt J Lesker ALD-150LX hardware returned 20 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
2Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
3Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
4High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
5Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
6Atomic Layer Deposition of Nanolayered Carbon Films
7Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
8Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
9Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
10Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
11Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
12Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
13Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
14Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
15AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
16Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
17Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
18Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
19A route to low temperature growth of single crystal GaN on sapphire
20Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN