Kurt J Lesker ALD-150LX Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Kurt J Lesker ALD-150LX hardware returned 12 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A route to low temperature growth of single crystal GaN on sapphire
2	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
3	High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
4	Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
5	Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
6	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
7	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
8	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
9	Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
10	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
11	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
12	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current

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