Publication Information

Title: Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 050605 (2016)

Date: 2016-08-17

DOI: http://dx.doi.org/10.1116/1.4961885

Author Information

Name

Institution

University of Alberta

University of Alberta

University of Alberta

University of Alberta

Films

Deposition Temperature Range = 40-250C

557-20-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000DI

Resistivity, Sheet Resistance

van der Pauw sheet resistance

Keithley 4200-SCS

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Substrates

Si(100)

Keywords

Notes

896



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