2022 Year in Review

February 2023 Stats


The publication database currently has 1673 entries.
204 Films
279 Precursors
78 Dep Hardware Sets
253 Characteristics
91 Theses
5136 Authors

Use Advanced Search for more complex searches


2021 Year in Review
ALD Links
Contact Us
LinkedIn Profile

Recent Database Additions
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes

Douglas W. Barlage Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Douglas W. Barlage returned 12 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
2Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
3Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
4Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
5Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
6Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
7High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
8Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
9Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
10Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
11ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
12Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN

© 2014-2023 plasma-ald.com