Douglas W. Barlage Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Douglas W. Barlage returned 12 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
2Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
3High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
4Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
5Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
6Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
7Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
8ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
9Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
10Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
11Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
12Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs