Douglas W. Barlage Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Douglas W. Barlage returned 12 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
2Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
3Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
4Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
5ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
6High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
7Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
8Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
9Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
10Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
11Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
12Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition