Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
Type:
Journal
Info:
2014 J. Phys. D: Appl. Phys. 47 345104
Date:
2014-06-24
Author Information
Name | Institution |
---|---|
Kevin Voon | University of Alberta |
Kyle Bothe | University of Alberta |
Pouyan Motamedi | University of Alberta |
Kenneth C. Cadien | University of Alberta |
Douglas W. Barlage | University of Alberta |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Notes
561 |