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Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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  • Surface cleaning
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Kurt J Lesker ALD-150L Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Kurt J Lesker ALD-150L hardware returned 15 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
2In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
3Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
4ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
5Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
6Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
7Structural and optical characterization of low-temperature ALD crystalline AlN
8Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
9Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
10Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
11XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
12Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
13Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
14AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
15Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition