Kurt J Lesker ALD-150L Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Kurt J Lesker ALD-150L hardware returned 15 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
2Structural and optical characterization of low-temperature ALD crystalline AlN
3Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
4Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
5Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
6AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
7Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
8Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
9Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
10XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
11Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
12In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
13Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
14Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
15Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics