Publication Information

Title:
Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2017, 9 (29), pp 24722-24730
Date:
2017-07-03

Author Information

Name Institution
Pouyan MotamediNational Institute for Nanotechnology, Alberta, Canada
Ken BosnickNational Institute for Nanotechnology, Alberta, Canada
Kai CuiNational Institute for Nanotechnology, Alberta, Canada
Ken CadienUniversity of Alberta
James David HoganUniversity of Alberta

Films

Plasma Ni


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: HAADF, High-Angle Annular Dark Field

Substrates

Sapphire

Keywords

Nucleation

Notes

1051