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Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2017, 9 (29), pp 24722-24730
Date:
2017-07-03
Author Information
| Name | Institution |
|---|---|
| Pouyan Motamedi | National Institute for Nanotechnology, Alberta, Canada |
| Ken Bosnick | National Institute for Nanotechnology, Alberta, Canada |
| Kai Cui | National Institute for Nanotechnology, Alberta, Canada |
| Kenneth C. Cadien | University of Alberta |
| James David Hogan | University of Alberta |
Films
Plasma Ni
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: HAADF, High-Angle Annular Dark Field
Substrates
| Sapphire |
Notes
| 1051 |