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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Pouyan Motamedi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Pouyan Motamedi returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
2In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
3Structural and optical characterization of low-temperature ALD crystalline AlN
4Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
5Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
6Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
7Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
8A route to low temperature growth of single crystal GaN on sapphire
9Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
10XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition