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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Pouyan Motamedi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Pouyan Motamedi returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
2XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
3Structural and optical characterization of low-temperature ALD crystalline AlN
4Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
5Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
6In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
7Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
8Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
9Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
10A route to low temperature growth of single crystal GaN on sapphire