Search 1556 plasma ALD publications by:
Search 1556 plasma ALD publications by:
Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
Type:
Conference Proceedings
Info:
CS MANTECH Conference, May 18th - 21st, 2015
Date:
2015-05-18
Author Information
Name | Institution |
---|---|
Kyle Bothe | University of Alberta |
A. Ma | University of Alberta |
Amir Afshar | University of Alberta |
Pouyan Motamedi | University of Alberta |
Kenneth C. Cadien | University of Alberta |
Douglas W. Barlage | University of Alberta |
Films
Plasma ZrO2
Plasma AlN
Film/Plasma Properties
Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Hysteresis
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Contact Resistance
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
Keywords
Notes
362 |
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