Name

Institution

Kyle Bothe

University of Alberta

A. Ma

University of Alberta

Amir Afshar

University of Alberta

Pouyan Motamedi

University of Alberta

Ken Cadien

University of Alberta

Douglas W. Barlage

University of Alberta

Plasma ZrO₂ using Kurt J Lesker ALD-150L

Deposition Temperature = 100C

TDMAZr, (Me₂N)₄Zr, [(CH₃)₂N]₄Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide

19756-04-8

Where to buy precursor

O₂, Oxygen

7782-44-7

Plasma AlN using Kurt J Lesker ALD-150L

Deposition Temperature = 250C

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

N₂, Nitrogen

7727-37-9

Characteristic

Analysis

Diagnostic

Interface Trap Density

C-V, Capacitance-Voltage Measurements

-

Hysteresis

C-V, Capacitance-Voltage Measurements

-

Contact Resistance

C-V, Capacitance-Voltage Measurements

-

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