Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Kyle Bothe Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Kyle Bothe returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
2Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
3ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
4Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
5Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
6High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
7Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN