Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN

Type:
Conference Proceedings
Info:
IEEE J. Electron Dev. Soc., Vol. 59, No. 10, May 2014, pp. 2662
Date:
2014-05-19

Author Information

Name Institution
Kevin VoonUniversity of Alberta
Kyle BotheUniversity of Alberta
Pouyan MotamediUniversity of Alberta
Douglas W. BarlageUniversity of Alberta
Kenneth C. CadienUniversity of Alberta

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Unknown
Analysis: I-V, Current-Voltage Measurements

Characteristic: Unknown
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

GaN

Notes

363