Publication Information

Title:
In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Adv. Mater. Interfaces 2018, 1800957
Date:
2018-09-18

Author Information

Name Institution
Pouyan MotamediNational Institute for Nanotechnology, Alberta, Canada
Ken BosnickNational Institute for Nanotechnology, Alberta, Canada
Kenneth C. CadienUniversity of Alberta
James David HoganUniversity of Alberta

Films

Plasma Ni


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: Optical Scattering

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Substrates

Sapphire

Keywords

Notes

1288