In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Adv. Mater. Interfaces 2018, 1800957
Date:
2018-09-18
Author Information
| Name | Institution |
|---|---|
| Pouyan Motamedi | National Institute for Nanotechnology, Alberta, Canada |
| Ken Bosnick | National Institute for Nanotechnology, Alberta, Canada |
| Kenneth C. Cadien | University of Alberta |
| James David Hogan | University of Alberta |
Films
Plasma Ni
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: Optical Scattering
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
| Sapphire |
Notes
| 1288 |