XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

Type:
Journal
Info:
Applied Surface Science 315 (2014) 104-109
Date:
2014-07-18

Author Information

Name Institution
Pouyan MotamediUniversity of Alberta
Kenneth C. CadienUniversity of Alberta

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(111)

Keywords

Notes

200