Publication Information

Title:
Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
Type:
Journal
Info:
2015 73rd Annual Device Research Conference (DRC)
Date:
2015-06-21

Author Information

Name Institution
Michael BarthThe Pennsylvania State University
G. Bruce Rayner, Jr.Kurt J. Lesker Company
S. MackU.S. Naval Research Laboratory
Brian R. BennettU.S. Naval Research Laboratory
Suman DattaThe Pennsylvania State University

Films


Film/Plasma Properties

Characteristic: Transistor Characteristics
Analysis: -

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

GaSb

Keywords

Notes

512