Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
Type:
Journal
Info:
2015 73rd Annual Device Research Conference (DRC)
Date:
2015-06-21
Author Information
Name | Institution |
---|---|
Michael Barth | The Pennsylvania State University |
G. Bruce Rayner, Jr. | Kurt J. Lesker Company |
S. Mack | U.S. Naval Research Laboratory |
Brian R. Bennett | U.S. Naval Research Laboratory |
Suman Datta | The Pennsylvania State University |
Films
Other HfO2
Film/Plasma Properties
Characteristic: Transistor Characteristics
Analysis: -
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
GaSb |
Notes
512 |