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Publication Information

Title: Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation

Type: Journal

Info: 2015 73rd Annual Device Research Conference (DRC)

Date: 2015-06-21

DOI: http://dx.doi.org/10.1109/DRC.2015.7175668

Author Information

Name

Institution

The Pennsylvania State University

Kurt J. Lesker Company

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

The Pennsylvania State University

Films

Deposition Temperature Range N/A

1333-74-0

19962-11-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Transistor Characteristics

Unknown

Unknown

Capacitance

C-V, Capacitance-Voltage Measurements

Unknown

Substrates

GaSb

Keywords

Notes

512



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