Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
Type:
Journal
Info:
2015 73rd Annual Device Research Conference (DRC)
Date:
2015-06-21
Author Information
| Name | Institution |
|---|---|
| Michael Barth | The Pennsylvania State University |
| G. Bruce Rayner, Jr. | Kurt J. Lesker Company |
| S. Mack | U.S. Naval Research Laboratory |
| Brian R. Bennett | U.S. Naval Research Laboratory |
| Suman Datta | The Pennsylvania State University |
Films
Other HfO2
Film/Plasma Properties
Characteristic: Transistor Characteristics
Analysis: -
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| GaSb |
Notes
| 512 |