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An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Power Sources 397 (2018) 32-36
Date:
2018-07-01

Author Information

Name Institution
Xian-Zong WangShanghai University
Triratna MuneshwarUniversity of Alberta
Hong-Qiang FanShanghai University
Kenneth C. CadienUniversity of Alberta
Jing-Li LuoShanghai University

Films



Film/Plasma Properties

Characteristic: Electrochemical Performance
Analysis: Custom

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Fermi Level Electronic Structure
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Interfacial Contact Resistance
Analysis: Custom

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Corrosion
Analysis: Custom

Substrates

SUS 304 Stainless Steel

Notes

1201