Name

Institution

Gem Shoute

University of Alberta

Amir Afshar

University of Alberta

Triratna Muneshwar

University of Alberta

Ken Cadien

University of Alberta

Douglas W. Barlage

University of Alberta

Thermal ZnO using Kurt J Lesker ALD-150LX

Deposition Temperature = 130C

DEZ, DiEthyl Zinc, ZnEt₂, Zn(C₂H₅)₂

557-20-0

Where to buy precursor

H₂O, Water

7732-18-5

Plasma HfO₂ using Kurt J Lesker ALD-150LX

Deposition Temperature = 100C

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

O₂, Oxygen

7782-44-7

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000DI

Transistor Characteristics

Transistor Characterization

-

Silicon

ZnO

764