Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current

Type:
Journal
Info:
Nature Communications, v. 7 (2016)
Date:
2016-01-06
DOI:
http://dx.doi.org/10.1038/ncomms10632

Author Information

Name Institution
Gem ShouteUniversity of Alberta
Amir AfsharUniversity of Alberta
Triratna MuneshwarUniversity of Alberta
Kenneth C. CadienUniversity of Alberta
Douglas W. BarlageUniversity of Alberta

Films

Thermal ZnO

Hardware used: Kurt J Lesker ALD-150LX
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 130C

Plasma HfO2

Hardware used: Kurt J Lesker ALD-150LX
TDMAHf, tetrakis(dimethylamido)hafnium, hafnium dimethylamide, (Me2N)4Hf, also CAS# 19782-68-4
CAS#: 19962-11-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000DI

Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Diagnostic: -

Substrates

Silicon
ZnO

Notes

764