Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices

Type:
Conference Proceedings
Info:
2016 IEEE International Conference on Plasma Science (ICOPS)
Date:
2016-06-13
DOI:
http://dx.doi.org/10.1109/PLASMA.2016.7534230

Author Information

Name Institution
Mei ShenUniversity of Alberta
Triratna MuneshwarUniversity of Alberta
Kenneth C. CadienUniversity of Alberta
Ying Yin TsuiUniversity of Alberta
Douglas W. BarlageUniversity of Alberta
Triratna MuneshwarUniversity of Alberta

Films

Plasma ZnO

Hardware used: Kurt J Lesker ALD-150LX
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

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