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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Carbon content control of silicon oxycarbide film with methane containing plasma
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Publication Information
Title:
Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
Type:
Conference Proceedings
Info:
2016 IEEE International Conference on Plasma Science (ICOPS)
Date:
2016-06-13
Author Information
| Name | Institution |
|---|---|
| Mei Shen | University of Alberta |
| Triratna Muneshwar | University of Alberta |
| Ken Cadien | University of Alberta |
| Ying Yin Tsui | University of Alberta |
| Douglas W. Barlage | University of Alberta |
| Triratna Muneshwar | University of Alberta |
Films
Plasma ZnO
Film/Plasma Properties
Substrates
Keywords
Notes
| 960 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |