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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
Type:
Conference Proceedings
Info:
2016 IEEE International Conference on Plasma Science (ICOPS)
Date:
2016-06-13
Author Information
| Name | Institution |
|---|---|
| Mei Shen | University of Alberta |
| Triratna Muneshwar | University of Alberta |
| Kenneth C. Cadien | University of Alberta |
| Ying Yin Tsui | University of Alberta |
| Douglas W. Barlage | University of Alberta |
| Triratna Muneshwar | University of Alberta |
Films
Plasma ZnO
Film/Plasma Properties
Substrates
Keywords
Notes
| 960 |