Atomic Layer Deposition of Nanolayered Carbon Films

Type:
Journal
Info:
C 2021, 7, 67.
Date:
2021-09-24

Author Information

Name Institution
Zhigang XiaoAlabama A&M University
Kim KisslingerBrookhaven National Laboratory
Rebhadevi MonikandanGeorgia Institute of Technology

Films

Plasma C


CAS#: 74-82-8


CAS#: 7440-37-1

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Substrates

Cu

Notes

1622