CH4, Methane, CAS# 74-82-8

Plasma Enhanced Atomic Layer Deposition Film Publications

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1Carbon content control of silicon oxycarbide film with methane containing plasma
2Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
3Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
4Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects