CH₄, Methane, CAS# 74-82-8

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
2	Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
3	Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects

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