Publication Information

Title:
Carbon content control of silicon oxycarbide film with methane containing plasma
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 062401 (2020)
Date:
2020-08-21

Author Information

Name Institution
Seokhwi SongHanyang University
Suhyeon ParkHanyang University
Chanwon JungHanyang University
Hyunwoo ParkHanyang University
Youngjoon KimHanyang University
Hyeongtag JeonHanyang University

Films

Plasma SiCOH


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Si(100)

Keywords

Notes

1509