Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


OMCTS, (CH3)2SiO-)4, OctaMethylCycloTetraSiloxane, CAS# 556-67-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Carbon content control of silicon oxycarbide film with methane containing plasma
2A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology