Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2020, 12 (39), pp 44225-44237
Date:
2020-08-31
Author Information
| Name | Institution |
|---|---|
| Elham Rafie Borujeny | University of Alberta |
| Oles Sendetskyi | University of Alberta |
| Michael D. Fleischauer | University of Alberta |
| Kenneth C. Cadien | University of Alberta |
Films
Plasma Ga2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Band Gap
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: HAADF, High-Angle Annular Dark Field
Substrates
| Sapphire |
| Si(100) |
| Si(111) |
| Si(110) |
Notes
| 1512 |