Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy TEG, triethyl galium, GaEt3 CAS# 1115-99-7

TEG, triethyl galium, GaEt3 CAS# 1115-99-7 is available from the following source(s):

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Triethylgallium
2DOCK/CHEMICALS🇩🇪Triethylgallium
3Strem Chemicals, Inc.🇺🇸Triethylgallium, elec. gr. (99.9999%-Ga)

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