Ga2O3 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ga2O3 films returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
2Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
3Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
4Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
5Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
6Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
7Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
8Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
9Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
10Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
11Plasma enhanced atomic layer deposition of Ga2O3 thin films
12Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
13Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
14RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
15Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
16Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition