Publication Information

Title:
Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Applied Physics 98, 023504 (2005)
Date:
2005-05-27

Author Information

Name Institution
F. K. ShanDong-Eui University
G. X. LiuDong-Eui University
Won-Jae LeeDong-Eui University
G. H. LeeDong-Eui University
I. S. KimDong-Eui University
B. C. ShinDong-Eui University

Films

Plasma Ga2O3

Hardware used: Custom

CAS#: 0-0-0

CAS#: 7782-44-7

Film/Plasma Properties

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Optical Properties
Analysis: Optical Transmission

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si(100)
Sapphire

Keywords

Notes

1261