Publication Information

Title:
Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
Type:
Journal
Info:
J. Vac. Sci. Technol. A 31(1), Jan/Feb 2013
Date:
2012-10-12

Author Information

Name Institution
İnci DönmezBilkent University
Çağla ÖzgitBilkent University
Necmi BiyikliBilkent University

Films

Plasma Ga2O3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si(111)

Keywords

Notes

RTA under N2 ambient.
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