Necmi Biyikli Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Necmi Biyikli returned 35 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
2Atomic layer deposition of GaN at low temperatures
3Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
4Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
5Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
6Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
7Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
8Electrical characteristics of β-Ga2O3 thin films grown by PEALD
9Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
10Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
11Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
12Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
13Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
14Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
15Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
16Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
17Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
18Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
19Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
20Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
21Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
22Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
23Metal-semiconductor-metal ultraviolet photodetectors based on gallium nitride grown by atomic layer deposition at low temperatures
24Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
25Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
26Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
27Self-Limiting Growth of GaN at Low Temperatures
28Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
29Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
30Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
31Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
32Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
33Template-assisted synthesis of III-nitride and metal-oxide nano-heterostructures using low-temperature atomic layer deposition for energy, sensing, and catalysis applications (Presentation Recording)
34Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
35The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition


Shortcuts



© 2014-2018 plasma-ald.com