Publication Information

Title:
Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
IEEE Transactions on Electron Devices, Volume:62, Issue:11, Page(s): 3627-3632, 2015
Date:
2015-09-28

Author Information

Name Institution
Halit AltuntasCankiri Karatekin University
Çağla ÖzgitBilkent University
İnci DönmezBilkent University
Necmi BiyikliBilkent University

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Effective Charge Density
Analysis: I-V, Current-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Silicon

Keywords

Notes

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