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Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
IEEE Transactions on Electron Devices, Volume:62, Issue:11, Page(s): 3627-3632, 2015
Date:
2015-09-28
Author Information
| Name | Institution |
|---|---|
| Halit Altuntas | Cankiri Karatekin University |
| Çağla Özgit | Bilkent University |
| İnci Dönmez | Bilkent University |
| Necmi Biyikli | Bilkent University |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Effective Charge Density
Analysis: I-V, Current-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Silicon |
Notes
| 459 |