Publication Information

Title: Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: IEEE Transactions on Electron Devices, Volume:62, Issue:11, Page(s): 3627-3632, 2015

Date: 2015-09-28

DOI: http://dx.doi.org/10.1109/TED.2015.2476597

Author Information

Name

Institution

Cankiri Karatekin University

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature = 200C

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Effective Charge Density

I-V, Current-Voltage Measurements

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Substrates

Silicon

Keywords

Notes

459



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