Publication Information

Title:
Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
Type:
Journal
Info:
J. Vac. Sci. Technol. A 30(2), Mar/Apr 2012
Date:
2012-02-17

Author Information

Name Institution
Mustafa AlevliBilkent University
Çağla ÖzgitBilkent University
İnci DönmezBilkent University
Necmi BiyikliBilkent University

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Optical Properties
Analysis: PL, PhotoLuminescence

Characteristic: Optical Properties
Analysis: Optical Transmission

Characteristic: Chemical Binding
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Substrates

Si(100)
Si(111)
Quartz
Sapphire

Keywords

Optical

Notes

TMA decomposition above 300 (ref 11).
Si RCA cleaned + HF dip.
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