Title: Self-Limiting Growth of GaN at Low Temperatures
Info: Acta Physica Polonica A 120, no. 6A (2011).
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
Thermo Scientific K-Alpha
J.A. Woollam VASE
Substrates HF dipped followed by DI rinse and N2 drying.
Ultratech Fiji PEALD GaN film development.
I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: email@example.com
© 2014-2018 plasma-ald.com