GaN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing GaN films returned 32 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A route to low temperature growth of single crystal GaN on sapphire
2	Atomic layer deposition of GaN at low temperatures
3	Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
4	Demonstration of flexible thin film transistors with GaN channels
5	Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
6	Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
7	Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
8	Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
9	Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
10	Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
11	Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
12	Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
13	Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
14	Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
15	Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
16	Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
17	Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
18	Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
19	Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
20	Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
21	Metal-semiconductor-metal ultraviolet photodetectors based on gallium nitride grown by atomic layer deposition at low temperatures
22	Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
23	Perspectives on future directions in III-N semiconductor research
24	Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
25	Self-Limiting Growth of GaN at Low Temperatures
26	Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
27	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
28	Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
29	Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
30	Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
31	Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
32	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition

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