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GaN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing GaN films returned 32 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A route to low temperature growth of single crystal GaN on sapphire
2Atomic layer deposition of GaN at low temperatures
3Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
4Demonstration of flexible thin film transistors with GaN channels
5Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
6Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
7Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
8Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
9Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
10Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
11Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
12Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
13Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
14Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
15Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
16Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
17Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
18Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
19Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
20Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
21Metal-semiconductor-metal ultraviolet photodetectors based on gallium nitride grown by atomic layer deposition at low temperatures
22Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
23Perspectives on future directions in III-N semiconductor research
24Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
25Self-Limiting Growth of GaN at Low Temperatures
26Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
27Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
28Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
29Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
30Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
31Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
32Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition

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